Effects of various RIE process-induced damages on MOSFET characteristics
- Author(s):
Min,B.W. ( Univ.of Texas/Austin ) Han,L.K. Joshi,A.B. Mann,R. Chung,L. Kwong,D.-L. - Publication title:
- Microelectronic Manufacturing Yield, Reliability, and Failure Analysis
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2635
- Pub. Year:
- 1995
- Page(from):
- 156
- Page(to):
- 165
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420015 [0819420018]
- Language:
- English
- Call no.:
- P63600/2635
- Type:
- Conference Proceedings
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