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Correlation between space charge created by Fowler-Nordheim electron injections and charge to breakdown(QBD)of gate oxides in MOS capacitors:modeling and experiment

Author(s):
Oualid,J. ( Domaine Univ.de Saint-Jerome )
Ciantar,E.
Moragues,J.M.
Sagnes,B.
Boivin,P.
Blaise,G.
1 more
Publication title:
Microelectronic Manufacturing Yield, Reliability, and Failure Analysis
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2635
Pub. Year:
1995
Page(from):
102
Page(to):
113
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420015 [0819420018]
Language:
English
Call no.:
P63600/2635
Type:
Conference Proceedings

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