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The influence of structure on dissolution inhibition for novolac-based photoresists: adaption of the probabilistic approach

Author(s):
Publication title:
Micro- and nanopatterning polymers
Title of ser.:
ACS symposium series
Ser. no.:
706
Pub. Year:
1998
Page(from):
292
Page(to):
305
Pub. info.:
Washington, DC: American Chemical Society
ISSN:
00976156
ISBN:
9780841235816 [0841235813]
Language:
English
Call no.:
A05800/706
Type:
Conference Proceedings

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