Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists

Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists

Author(s):

Allen, Robert D. ( IBM Almaden Research Center )

Sooriyakumaran, Ratnam

Hofer, Donald C.

3 more

Publication title:

Micro- and nanopatterning polymers

Title of ser.:

ACS symposium series

Ser. no.:

706

Pub. Year:

1998

Page(from):

224

Page(to):

236

Pub. info.:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841235816 [0841235813]

Language:

English

Call no.:

A05800/706

Type:

Conference Proceedings

Details

TDL ID:	ZA00019278
Series ID:	PA00000004
Conf. info. (Name):	ACS National Meeting
Conf. info. (Number):	214th
Conf. info. (Venue):	Las Vegas, NV, USA
Conf. info. (Date):	1997.09.07-1997.09.11

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