Blank Cover Image

Fabrication of an aspherical mirror for Extreme Ultra-Violet Lithography (EUVL) optics

Author(s):
Niibe, Masahito ( Himeji Institute of Technology, Japan )
Miyafuji, Atsushi
Kinoshita, Hiroo
Watanabe, Takeo
Inoue, Shozo
Koterazawa, Keiji
1 more
Publication title:
Advances in mirror technology for synchrotron x-ray and laser applications : 20 July 1998, San Diego, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3447
Pub. Year:
1998
Page(from):
32
Page(to):
39
Pub. info.:
Bellingham, Wash., USA: SPIE
ISSN:
0277786X
ISBN:
9780819429025 [0819429023]
Language:
English
Call no.:
P63600/3447
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Sugisaki,K., Oshino,T., Murakami,K., Watanabe,T., Kinoshita,H., Miyafuji,A., Irie,S., Shirayone,S.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Mask technology of extreme-ultraviolet lithography (Invited Paper)

Kinoshita,H., Wantanabe,T., Ozawa,A., Niibe,M.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Development for the alignment procedure of three-aspherical-mirror optics

Irie,S., Watanabe,T., Kinoshita,H., Miyafuji,A., Sugisaki,K., Oshino,T., Murakami,K.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings NANOSCALE PARTICLES REMOVAL ON AN EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL) MASK LAYER BY LASERSHOCK CLEANING

S.-H. Lee, S.-H Lee, J.-G. Park, A. A. Busnaina, J.-M. Lee, T.-H. Kim, G. Zhang, F. Eschbach, A. Ramamoorthy

Electrochemical Society
3 Conference Proceedings Progress in the development of three-aspherical mirror optics for EUVL

Kinoshita,H., Watanabe,T., Bajuk,D.J., Daniel,J., Kimpara,Y., Kriese,M.D., Platonov,Y.Y.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Phase Transformations of Ferromagnetic Fe-Pd-Pt-Based Shape Memory Alloys

Yang, Gwon-Seung, Jonasson, Reid, Baek, Seung-Nam, Murata, Kinzo, Inoue, Shozo, Koterazawa, Keiji, Jeong, Soon-Jong, …

Materials Research Society
4 Conference Proceedings Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Protection from surface oxidation of Ru capping layers for EUVL projection optics mirrors by introducing hydrocarbon gas

K. Koida, M. Niibe, Y. Kakutani, S. Matsunari, T. Aoki

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Three-aspherical-mirror system for EUV lithography (Invited Paper)

Kinoshita,H., Watanabe,T., Niibe,M., Ito,M., Oizumi,H., Yamanashi,H., Murakami,K., Oshino,T., Platonov,Y.Y., Grupido,N.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Design of LIGA beamline using a multilayer-coated reflection mirror

Kinoshita, H., Kimpara, Y., Uruga, T., Watanabe, T., Niibe, M., Platonov, Y., Wood, J.L.

SPIE
6 Conference Proceedings Recent advances of three-aspherical-mirror system for EUVI

Kinoshita,H., Watanabe,T., Li,Y., Miyafuji,A., Oshino,T., Sugisaki,K., Murakami,K., Irie,S., Shirayone,S., Okazaki,S.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings 22 nm node contact hole formation in extreme ultra-violet lithography

E.-J. Kim, K.-H. Kim, H.-R. Park, J.-Y. Yeo, J.-S. Kim

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12