Mixed-proximity holographic mask technology for 50-nm VLSI by x-ray lithography

Mixed-proximity holographic mask technology for 50-nm VLSI by x-ray lithography

Author(s):

Burge,R.E. ( Univ.of Cambridge (UK) and King's College London (UK) )
Knauer,J.N. ( Univ.of Cambridge (UK) )
Yuan,X.-C. ( Univ.of Cambridge (UK) and King's College London (UK) )
Powell,K. ( King's College London (UK) )

Publication title:

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3331

Pub. Year:

1998

Page(from):

280

Page(to):

290

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427762 [0819427764]

Language:

English

Call no.:

P63600/3331

Type:

Conference Proceedings

Details

TDL ID:	ZA00019241
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	1998 : 2nd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings X-ray holography for VLSI using synthetic bilevel holograms Burge,R.E., Knauer,J., Yuan,X.-C., Powell,K. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Soft x-ray imaging and vector diffraction theory R.E. Burge, X.-C. Yuan Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Imaging capabilities of proximity x-ray lithography at 70-nm ground rules Krasnoperova,A.A., Rippstein,R.P., Flamholz,A.L., Kratschmer,E., Wind,S., Brooks,C.J., Lercel,M.J. SPIE - The International Society for Optical Engineering
3 Conference Proceedings High transmission mask technology for 45nm node imaging [6154-50] Conley, W., Morgana, N., Kasprowicz B S, Cangemi M, Lassiter M, Litt L C, Cangemin M, Cottle R, Wu W, Cobb J, Ham Y M, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Mask error factor impact on the 130-nm node Randall,J.N., Baum,C.C., Kim,K., Mason,M.E. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Pellicles for x-ray lithography masks Maldonado,J.R., Cordes,S.A., Leavey,J.A., Acosta,R.E., Doany,F., Angelopoulos,M., Waskiewicz,C. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Advanced photomask repair technology for 65-nm lithography [6349-50] Aramaki, F., Kozakai, T., Muramatsu, M., Sugiyama, Y., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Doi, T., … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Advances in stencil mask technology:control of distortion in ion-projection lithography masks Wolfe,J.C., Shimkunas,A.R., Melngailis,J., Loschner,H., Mohondro,R.D., Randall,J.N. SPIE-The International Society for Optical Engineering	11 Conference Proceedings THE STABILITY OF ION PROJECTION LITHOGRAPHY MASKS Randall, J.N., Bellavance, D., Sivasankar, R. Materials Research Society
6 Conference Proceedings Mask technology for EUV lithography Bujak,M., Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Moore,C.E., Prisbrey,S., Sweeney,D.W., Tong,W.M., Vernon,S.P., … SPIE - The International Society for Optical Engineering	12 Conference Proceedings Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond Cheng, W.-H., Chakravorty, K.K., Farnsworth, J.N. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12