Transient thermal distortions of x-ray mask membranes during exposure scanning
- Author(s):
- Feng,Z. ( Univ.of Wisconsin/Madison )
- Engelstad,R.L. ( Univ.of Wisconsin/Madison )
- Lovell,E.G. ( Univ.of Wisconsin/Madison )
- Cerrina,F. ( Univ.of Wisconsin/Madison )
- Publication title:
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3331
- Pub. Year:
- 1998
- Page(from):
- 261
- Page(to):
- 274
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427762 [0819427764]
- Language:
- English
- Call no.:
- P63600/3331
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Equivalent modeling technique for predicting the transient thermomechanical response of optical reticles during exposure
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Pattern transfer distortions in IPL and EPL masks with pattern density gradients
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Finite element modeling of ion-beam lithography masks for pattern transfer distortions
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Dynamic characterization of step-induced vibrations of x-ray mask membranes
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |