Imaging interferometric lithography for arbitrary patterns
- Author(s):
- Chen,X. ( Univ.of New Mexico )
- Brueck,S.R.J. ( Univ.of New Mexico )
- Publication title:
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3331
- Pub. Year:
- 1998
- Page(from):
- 214
- Page(to):
- 224
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427762 [0819427764]
- Language:
- English
- Call no.:
- P63600/3331
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Experimental comparison of off-axis illumination and imaging interferometric lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Imaging interferometric lithography:extending optics to fundamental limits and beyond
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Spatial frequency analysis of optical lithography resolution enhancement techniques
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Process development for 180-nm structures using interferometric lithography and i-line photoresist
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Grating analysis of frequency parsing strategies for imaging interferometric lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |