Blank Cover Image

High-power extreme-ultraviolet source based on gas jets

Author(s):
Publication title:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3331
Pub. Year:
1998
Page(from):
81
Page(to):
89
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
Language:
English
Call no.:
P63600/3331
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography

Kubiak,G.D., Bernardez,L.J., Krenz,K.D., Sweatt,W.C.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Measurement of mid-spatial-frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements

Fields,C.H., Ray-Chaudhuri,A.K., Krenz,K.D., Oldham,W.G., Stulen,R.H.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings High-power source and illumination system for extreme ultraviolet lithography

Kubiak,G.D., Bernardez,L.J., Krenz,K D., Replogle,W.C., Sweatt,W.C., Sweeney,D.W., Hudyma,R.M., Shields,H.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras

A.K. Ray-Chaudhuri, R.P. Nissen, K.D. Krenz, R.H. Stulen

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Development of a high-average-power extreme-ultraviolet electric capillary discharge source

Fornaciari,N.R., Bender,H., Buchenauer,D., Kanouff,M.P., Karim,S., Kubiak,G.D., Moen,C.D., Shimkaveg,G.M., …

SPIE-The International Society for Optical Engineering
9 Conference Proceedings High-power coherent sources based on antiguided structures

L.J. Mawst, D. Botez

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings EUV absorption in a laser-produced plasma source

Kanouff,M.P., Shields,H., Bernardez,L.J., Kubiak,G.D.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Extreme ultraviolet lithography for circuit fabrication at 0.1-µm feature size

D.A. Tichenor, G.D. Kubiak, R.H. Stulen

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Recent advances in the Sandia EUV 10x microstepper (Invited Paper)

Goldsmith,J.E.M., Wronosky,J.B., Barr,P.K., Berger,K.W., Bernardez II,L.J., Cardinale,G.F., Darnold,J.R., Folk,D.R., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings High-power extreme ultraviolet source based on a Z-pinch

McGeoch,M.W.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Power scale-up of the extreme-ultraviolet electric capillary discharge source

Fornaciari, N.R., Bender, H., Buchenauer, D., Dimkoff, J.L., Kanouff, M.P., Karim, S., Romeo, C., Shimkaveg, G.M., …

SPIE-The International Society for Optical Engineering
12 Conference Proceedings High-power laser-produced-plasma EUV source

Ballard, W.P., Bernardez, L.J, II., Lafon, R.E., Anderson, R.J., Perras, Y.E., Leung, A.H., Shields, H., Petach, M.B., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12