Three-aspherical-mirror system for EUV lithography (Invited Paper)

Author(s):

Kinoshita,H. ( Himeji Institute of Technology (Japan) )

Watanabe,T. ( Himeji Institute of Technology (Japan) )

Niibe,M. ( Himeji Institute of Technology (Japan) )

Ito,M. ( Hitachi Central Research Lab. (Japan) )

Oizumi,H. ( Hitachi Central Research Lab. (Japan) )

Yamanashi,H. ( Hitachi Central Research Lab. (Japan) )

Murakami,K. ( Nikon Corp. (Japan) )

Oshino,T. ( Nikon Corp. (Japan) )

Platonov,Y.Y. ( Osmic Inc. )

Grupido,N. ( Osmic Inc. )

5 more

Publication title:

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3331

Pub. Year:

1998

Page(from):

20

Page(to):

31

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427762 [0819427764]

Language:

English

Call no.:

P63600/3331

Type:

Conference Proceedings