Simulation of charging voltages on a wafer during plasma etch

Simulation of charging voltages on a wafer during plasma etch

Author(s):

Oner,M. ( Vanderbilt Univ. )
Bhuva,B.L. ( Vanderbilt Univ. )
Sisterhen,P. ( Vanderbilt Univ. )
Hasan,H. ( Vanderbilt Univ. )
Kerns,S.E.

Publication title:

Microelectronic Manufacturing Yield, Reliability, and Failure Analysis IV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3510

Pub. Year:

1998

Page(from):

229

Page(to):

232

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819429698 [0819429694]

Language:

English

Call no.:

P63600/3510

Type:

Conference Proceedings

Details

TDL ID:	ZA00019231
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing Yield, Reliability, and Failure Analysis
Conf. info. (Number):	1998 : 4th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	1998.09.23-1998.09.24

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