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Probe microloading effect of in-situ etch in EPROM stack-gate process

Author(s):
  • Chiou,J.M. ( Taiwan Semiconductor Manufacturing Co. )
  • Pan,S.L. ( Taiwan Semiconductor Manufacturing Co. )
  • Ching,K.M. ( Taiwan Semiconductor Manufacturing Co. )
  • Chang,B.J. ( Taiwan Semiconductor Manufacturing Co. )
  • Lu,K.L. ( Taiwan Semiconductor Manufacturing Co. )
Publication title:
Microelectronic Manufacturing Yield, Reliability, and Failure Analysis IV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3510
Pub. Year:
1998
Page(from):
219
Page(to):
224
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429698 [0819429694]
Language:
English
Call no.:
P63600/3510
Type:
Conference Proceedings

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