New mask having functions of OAI and PSM to realize sub-0.2-ｦﾌm patterns with 248 nm in microlithography

New mask having functions of OAI and PSM to realize sub-0.2-ｦﾌm patterns with 248 nm in microlithography

Author(s):

Luo,X. ( Institute of Optics and Electronics )
Yao,H.
Chen,X.
Feng,B.

Publication title:

Optical microlithography XII : 17-19 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3679

Pub. Year:

1999

Vol.:

Part2

Page(from):

745

Page(to):

749

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431530 [0819431532]

Language:

English

Call no.:

P63600/3679

Type:

Conference Proceedings

Details

TDL ID:	ZA00019002
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	1999 : 12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.17-1999.03.19

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