Automatic parallel optical proximity correction system for application with hierarchical data structure
- Author(s):
- Tsujimoto,E. ( Hitachi,Ltd. )
- Watanabe,T.
- Nakajo,K.
- Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part2
- Page(from):
- 675
- Page(to):
- 685
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Automatic optical proximity correction with optimization of stepper condition
Society of Photo-optical Instrumentation Engineers |
2
Conference Proceedings
Application of automatic parallel fracturing system on hierarchical and large data structure
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Hierarchical mask data design system (PROPHET) for aerial image simulation,automatic phase-shifter placement,and subpeak overlap checking
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Design optimization of optical proximity correction mask for device manufacturing
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Electrical test structures for the characterisation of optical proximity correction
SPIE - The International Society of Optical Engineering |