Practical methodology of optical proximity correction in subquarter-micron lithography
- Author(s):
Lim,C.-M. ( Hyundai Electronics Industries Co.Ltd. ) Seo,J.-W. Kang,C.-S. Park,Y.-S. Yoon,J.-T. Lee,C.-S. Moon,S.-C. Kim,B.-H. - Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part2
- Page(from):
- 666
- Page(to):
- 674
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
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