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Application of a new approach to optical proximity correction

Author(s):
Rosenbusch,A. ( Sigma-C GmbH )
Hourd,A.C.
Juffermans,C.A.
Kirsch,H.
Lalanne,F.P.
Maurer,W.
Romeo,C.
Ronse,K.
Schiavone,P.
Simecek,M.
Toublan,O.
Vermeuien,T.
Watson,J.C.
Ziegler,W.
9 more
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. Year:
1999
Vol.:
Part2
Page(from):
639
Page(to):
647
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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