ArF step-and-scan exposure system for 0.15-ヲフm and 0.13-ヲフm technology nodes
- Author(s):
Mulkens,J. ( ASM Lithography BV ) Stoeldraijer,J.M. Davies,G. Dierichs,M. Heskamp,B. Moers,M.H. George,R.A. Roempp,O. Glatzel,H. Wagner,C. Pollers,I. Jaenen,P. - Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 506
- Page(to):
- 521
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
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