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0.7-NADUV step-and-scan system for 150-nm imaging with improved overlay

Author(s):
Schoot,J.van ( ASM Lithography BV )
Bornebroek,F.
Suddendorf,M.
Mulder,M.
Spek,J.van der
Stoeten,J.
Hunter,A.
Rummer,P.
3 more
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. Year:
1999
Vol.:
Part1
Page(from):
448
Page(to):
463
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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