Understanding systematic and random CD variations using predictive modeling techniques
- Author(s):
- Flagello,D.G. ( ASM Lithography BV )
- Laan,H.van der
- Schoot,J.van
- Bouchoms,I.
- Geh,B.
- Publication title:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3679
- Pub. Year:
- 1999
- Vol.:
- Part1
- Page(from):
- 162
- Page(to):
- 175
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- Language:
- English
- Call no.:
- P63600/3679
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask [6281-16]
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Etch, reticle, and track CD fingerprint corrections with local dose compensation
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Lithographic lens testing:analysis of measured aerial images,interferometric data,and photoresist measurements
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Understanding illumination effects for control of optical proximity effects (OPE)
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |