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Effects of phase-shift masks on across-field linewidth control

Author(s):
Schenker,R.E. ( Intel Corp. )  
Publication title:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3679
Pub. Year:
1999
Vol.:
Part1
Page(from):
18
Page(to):
26
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
Language:
English
Call no.:
P63600/3679
Type:
Conference Proceedings

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