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Novel polymers for 193-nm single-layer resist based on cycloolefin polymers

Author(s):
Kim,H.-W. ( Samsung Electronics Co.,Ltd. )
Lee,S.-H.
Kwon,K.-Y.
Jung,D.-W.
Lee,S.
Yoon,K.-S.
Choi,S.-J.
Woo,S.-G.
Moon,J.-T.
4 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part2
Page(from):
1100
Page(to):
1107
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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