Second-generation 193-nm bottom antireflective coatings(BARCs)

Second-generation 193-nm bottom antireflective coatings(BARCs)

Author(s):

Meador,J.D. ( Brewer Science,Inc. )

Publication title:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3999

Pub. Year:

2000

Vol.:

Part2

Page(from):

1009

Page(to):

1018

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

Language:

English

Call no.:

P63600/3999

Type:

Conference Proceedings

Details

TDL ID:	ZA00018975
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2000 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.02.28-2000.03.01

Similar Items:

1 Conference Proceedings Thin organic bottom antireflective coatings for 193-nm lithography Bhave, M., Meador, J.D., Claypool, J.B., Deshpande, S.V., Akers, J., Lindgren, A. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Deep-ultraviolet antireflective coating with improved conformality,optical density,and etch rate Guerrero,D.J., Meador,J.D., Xu,G., Suzuki,H., Sone,Y., Krishnamurthy,V., Claypool,J., Lamb,III,J.E. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs) Meador,J.D., Shao,X., Bhave,M., Cox,C., Thompson,J., Thomas,D.L., Gibbons,S., Farnsworth,A., Rich,M.D. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Bottom antireflective coatings (BARCs) for 157-nm lithography He, L., Puligadda, R., Lowes, J., Rich, M.D. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Recent progress in 193-nm antireflective coatings Meador, J. D., Guerrero, D. J., Xu, G., Shao, X., Dobson, N., Claypool, J., Nowak, K. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Bottom antireflective coatings (BARCs) for 157-nm lithography He, L., Puligadda, R., Lowes, J., Rich, M.D. SPIE-The International Society for Optical Engineering
4 Conference Proceedings New materials for 193-nm bottom antireflective coatings Weimer, M., Krishnamurthy, V., Fowler, S., Nesbit, C., Claypool, J.B. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Design considerations for bottom antireflective coating for 157-nm lithography Claypool, J.B., Puligadda, R., Akers, J., Sakamoto, R., Mizusawa, K.-I. SPIE-The International Society for Optical Engineering
5 Conference Proceedings New fast-etching bottom antireflective coatings for 248-nm lithography Puligadda,R., Huang,R., Cox,C., Lamb Ⅲ,J.E., Arjona,M., Claypool,J.B. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Broadband planarizing antireflective coating for i-line, DUV, and 193-nm microlithographic applications Xie Shao, James E. Lamb III, James B. Claypool, William J. Simmons, Earnest C. Murphy SPIE - The International Society of Optical Engineering
6 Conference Proceedings Development of full-fill bottom bottom antireflective coatings for dual-damascene process Wang,Y., Wu,X., Xu,G., Lamb Ⅲ,J.E., Sullivan,J., Claypool,J.B., Backus,J., Trautman,S., Shao,X., Takei,S., Sone,Y., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Developable bottom antireflective coatings for 248-nm and 193-nm lithography Katayama, T., Motobayashi, H., Kang, W.-B., Toukhy, M.A., Oberlander, J.E., Ding, S.S., Neisser, M. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12