Blank Cover Image

Characteristic study of electron beam stabilization for deep-UV photoresists

Author(s):
Kim,M.-S. ( Hyundai Electronics Industries Co.,Ltd. )
Choi,J.-H.
Rho,C.-H.
Hong,M.-J.
Jun,B.-J.
Gil,M.-G.
Kim,B.-H.
Ahn,D.-J.
Ross,M.F.
Wong,S.S.
5 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part2
Page(from):
782
Page(to):
792
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Investigation of electron beam stabilization of 193-nm photoresists

Kim,M.-S., Park,J.-W., Kim,H.-J., Jun,B.-J., Gil,M.-G., Kim,B.-H., Ross,M.F., Livesay,W.R.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Photoresist stabilization for ion implant processing

Ross,M.F., Livesay,W.R., Starov,V., Ostrowski,K., Wong,S.Y.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Dielectric and chemical characteristics of electron-beam-cured photoresist

E.S. Sison, M.D. Rahman, D.L. Durham, J. Hermanowski, M.F. Ross

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Evaluation of electron-beam stabilization for ion implant processing

Buffat, S. J., Kickel, B., Philipps, B., Adams, J., Ross, M. F., Minter, J. P., Marlowe, T., Wong, S. S.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Mechanism studies of scanning electron microscope measurement effects on 193-nm photoresists and the development of improved line-width measurement methods

Sarrubi,T.R., Ross,M.F., Neisser,M., Kocab,T., Beauchemin,B.T., Livesay,W.R., Wong,S.S., Ng,W.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Modification of 193-nm (ArF) photoresists by electron beam stabilization

Martens,P.M., Yamamoto,S., Edamatsu,K., Uetani,Y., Pain,L., Palla,R., Ross,M.F., Livesay,W.R.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Design and properties of new deep-UV positive photoresist

Choi,S.-J., Jung,S.-Y., Kim,C.-H., Park,C.-G., Han,W.-S., Koh,Y.-B., Lee,M.-Y.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Advanced metal lift-off process using electron-beam flood exposure of single-layer photoresist

Minter, J. P., Ross, M. F., Livesay, W. R., Wong, S. S., Narcy, M. E., Marlowe, T.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Plasma etch characteristics of electron-beam processed photoresist

M.F. Ross, D. Comfort, G. Gorin

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Reflow process stabilization by chemical characteristics and process conditions

Kim, M.-S., Park, J.-H., Kim, H.-J., Kim, I.-H., Jeon, J.-H., Gil, M.-G., Kim, B.-H.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Electron-beam processing of deep-UV resist

Ross,M.F., Livesay,W.R., Petrillo,K.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Study of the beam blur and its effect on the future mask fabrication [6349-33]

Lee, S., Park, S., Ahn, M., Doh, J., Kim, S., Kim, B., Choi, S., Han, W.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12