Blank Cover Image

Synthesis and lithographic performance of poly-4-hydroxphenyl-ethyl-methacrylate-based negative resists

Author(s):
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part1
Page(from):
559
Page(to):
568
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Advanced negative resists using novel aminoplast crosslinkers

Afzali,A., Gelorme,J.D., Kosbar,L.L., Neisser,M.O., Brunswold,W., Feild,C., Lawson,M., Varanasi,R.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Effects of crosslinking agent on lithographic performance of negative-tone resists based on poly(p-hydroxystyrene)

Lin,Q., Katnani,A.D., Willson,C.G.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Synthesis of Oligomeric p-Phenyleneimine by Self-Condensation Reaction of a Novel Monomer

Afzali, A., Gelorme, J. D.

MRS - Materials Research Society
8 Conference Proceedings Conducting electron-beam resists based on polyaniline

Hupcey,M.A.Z., Angelopoulos,M., Gelorme,J.D., Ober,C.K.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Patterning of highly conducting polyaniline films

Graham,T.O., Afzali,A., Angelopoulos,M., Gelorme,J.D., Shaw,J.M.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Thin-Film Transistors Based on Spin-Coated Chalcogenide Semiconductor Channels Invited Paper

Mitzi, D.B., Copel, M., Murray, C.E., Kosbar, L., Afzali, A.

Electrochemical Society
4 Conference Proceedings Improved resolution with advanced negative DUV photoresist with 0.26N capability

Prokopowicz, G. P., Georger, J. H. Jr., Ayyash, E., Thackeray, J. W., Brunsvold, W. R., Kosbar, L. L., Afzali, A., …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings High-aspect-ratio resist for thick-film applications

N.C. LaBianca, J.D. Gelorme

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Bio-based resins for the manufacture of printed wiring boards

Kosbar, Laura L., Gelorme, Jeffrey

Society of Plastics Engineers, Inc. (SPE)
11 Conference Proceedings Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems

Padmanaban,M., Cook,M.M., Durham,D.L., Khanna,D.N., Klauck-Jacobs,A., Oberlander,J., Rahman,D., Dammel,R.R.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Lithographic performance of a dry-etch stable methacrylate resist at 193 nm

Dammel,R.R., Ficner,S.A., Oberlander,J.E., Klauck-Jacobs,A., Padmanaban,M., Khanna,D.N., Durham,D.L.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance

Patel, K.S., Lawson, M.C., Varanasi, P.R., Medeiros, D.R., Wallraff, G.M., Brock, P.J., DiPietro, R.A., Nishimura, Y., …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12