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Polymers for 157-nm photoresist applications:a progress report

Author(s):
Patterson,K. ( Univ.of Texas at Austin )
Yamachika,M.
Hung,R.
Brodsky,C.J.
Yamada,S.
Somervell,M.H.
Osborn,B.
Hall,D.
Dukovic,G.
Byers,J.D.
Conley,W.E.
Willson,C.G.
7 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part1
Page(from):
365
Page(to):
374
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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