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Prospects for using existing resists for evaluating 157-nm imaging systems

Author(s):
Fedynyshyn,T.H. ( MIT Lincoln Lab. )
Kunz,R.R.
Doran,S.P.
Goodman,R.B.
Lind,M.L.
Curtin,J.E.
1 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part1
Page(from):
335
Page(to):
346
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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