Toward controlled resist line-edge roughness:material origin of line-edge roughness in chemically amplified positive-tone resists
- Author(s):
- Lin,Q. ( IBM Thomas J.Watson Research Ctr. )
- Sooriyakumaran,R.
- Huang,W.
- Publication title:
- Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3999
- Pub. Year:
- 2000
- Vol.:
- Part1
- Page(from):
- 230
- Page(to):
- 239
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436177 [0819436178]
- Language:
- English
- Call no.:
- P63600/3999
- Type:
- Conference Proceedings
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