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Modeling chemically amplified resists for 193-nm lithography

Author(s):
Croffie,E.H. ( Univ.of California/Berkeley )
Cheng,M.
Neureuther,A.R.
Houlihan,F.M.
Cirelli,R.A.
Sweeney,J.R.
Dabbagh,G.
Watson,G.P.
Nalamasu,O.
Rushkin,I.L.
Dimov,O.
Gabor,A.H.
7 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part1
Page(from):
171
Page(to):
180
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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