193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
- Author(s):
Amblard,G.R. ( International SEMATECH ) Byers,J.D. Domke,W.D. Rich,G.K. Graffenberg,V.L. Patel,S. Miller,D.A. Perez,G.B. - Publication title:
- Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3999
- Pub. Year:
- 2000
- Vol.:
- Part1
- Page(from):
- 32
- Page(to):
- 53
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436177 [0819436178]
- Language:
- English
- Call no.:
- P63600/3999
- Type:
- Conference Proceedings
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