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193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?

Author(s):
Amblard,G.R. ( International SEMATECH )
Byers,J.D.
Domke,W.D.
Rich,G.K.
Graffenberg,V.L.
Patel,S.
Miller,D.A.
Perez,G.B.
3 more
Publication title:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3999
Pub. Year:
2000
Vol.:
Part1
Page(from):
32
Page(to):
53
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
Language:
English
Call no.:
P63600/3999
Type:
Conference Proceedings

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