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*Soft X-rays for deep sub-100 nm lithography, with and without masks

Author(s):
Smith, Henry I.
Carter, D. J.D.
Ferrera, J.
Gil, D.
Goodberlet, J.
Hastings, J. T.
Lim, M. H.
Meinhold, M.
Menon, R.
Moon, E. E.
Ross, C. A.
Savas, T.
Walsh, M.
Zhang, F.
9 more
Publication title:
Materials issues and modeling for device nanofabrication : symposia held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
584
Pub. Year:
2000
Page(from):
11
Pub. info.:
Warrendale, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558994928 [1558994920]
Language:
English
Call no.:
M23500/584
Type:
Conference Proceedings

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