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Compositional Characterization of Very Thin SiO2/Si3N4/SiO2 Stacked Films by XPS Using the Auger Parameter Method

Author(s):
Santucci, S.
Lozzi, L.
Passacantando, M.
Picozzi, P.
Alfonsetti, R.
Fama, F.
Moccia, G.
2 more
Publication title:
Structure and properties of multilayered thin films : symposium held April 17-19, 1995, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
382
Pub. Year:
1995
Page(from):
437
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992856 [1558992855]
Language:
English
Call no.:
M23500/382
Type:
Conference Proceedings

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