Blank Cover Image

In Situ Control of Wet Etching Using Spectroscopic Ellipsometry

Author(s):
Publication title:
III-V and IV-IV materials and processing challenges for highly integrated microelectronics and optoelectronics : symposium held November 30-December 3, 1998, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
535
Pub. Year:
1999
Page(from):
201
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994416 [1558994416]
Language:
English
Call no.:
M23500/535
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings IN SITU STUDIES OF ELECTRON CYCLOTRON RESONANCE PLASMA ETCHING OF SEMICONDUCTORS BY SPECTROSCOPIC ELLIPSOMETRY

Nafis, S., Ianno, N.J., Snyder, Paul G., Woollam, John A., Johs, Blaine

Materials Research Society
7 Conference Proceedings REFLECTANCE ANISOTROPY AND SPECTROSCOPIC ELLIPSOMETRY CHARACTERISATION OF WET SILICON WAFER CLEANING

Beechinor, J. T., Kelly, P. V., Crean, G. M.

MRS - Materials Research Society
2 Conference Proceedings In-situ monitor and control using fast spectroscopic ellipsometry

Woollam,J.A., Gao,X., Heckens,S., Hilfiker,J.N.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings TEMPERATURE DEPENDENCE OF OPTICAL PROPERTIES OF AIAs. STUDIED BY IN SITU SPECTROSCOPIC ELLIPSOMETRY

Yao, Huade,, Snyder, Paul G., Stair, Kathleen, Bird, Thomas

Materials Research Society
3 Conference Proceedings IN SITU AND EX SITU APPLICATIONS OF SPECTROSCOPIC ELLIPSOMETRY

Woollam, John A., Johs, Blaine, McGahan, William A., Snyder, Paul G., Hale, Jeffrey, Yao, Huade Walter

MRS - Materials Research Society
9 Conference Proceedings In situ spectroscopic ellipsometry for the real time process control of plasma etching of silicon nitride

Rosen, I. G., Parent, T., Fidan, B., Madhukar, A.

MRS-Materials Research Society
4 Conference Proceedings GaAs(100) SURFACE MODIFICATIONS AT ELEVATED TEMPERATURES, STUDIED BY IN-SITU SPECTROSCOPIC ELLIPSOMETRY

Yao, Huade, Snyder, Paul G., Woollam, John A.

Materials Research Society
10 Conference Proceedings Real-Time Feedback Control of Thermal Cl2 Etching of GaAs Based on In Situ Spectroscopic Ellipsometry

Parent, T., Heitz, R., Chen, P., Madhukar, A.

MRS - Materials Research Society
5 Conference Proceedings IN-SITU ELLIPSOMETRY STUDY OF PULSED LASER DEPOSITED ZnO FILMS

Pittal, Shakil, McConville, L. A., Ianno, N. J., Snyder, P. G.

Materials Research Society
11 Conference Proceedings STUDY OF ION IMPLANTED COPPER LASER MIRRORS BY SPECTROSCOPIC ELLIPSOMETRY

Snyder, P.G., Massengale, A., Memarzadeh, K., Woollam, J.A., Ingram, D.C., Pronko, P.P.

Materials Research Society
6 Conference Proceedings IN-SITU ELLIPSOMETRY STUDY OF PULSED LASER DEPOSITED ZnO FILMS

Pittal, Shakil, McConville, L. A., Ianno, N. J., Snyder, P. G.

Materials Research Society
12 Conference Proceedings In situ spectroscopic ellipsometry study of the oxide etching and surface damaging processes on silicon under hydrogen plasma

Vargas, I. M., Manso, J. Y., Guzman, J. R., Weiner, B. R., Morell, G.

MRS-Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12