X-ray-Absorption-Fine-Structure (XAFS) Studies of Cobalt Silicide Thin Films

X-ray-Absorption-Fine-Structure (XAFS) Studies of Cobalt Silicide Thin Films

Author(s):

Publication title:

Applications of synchrotron radiation techniques to materials science IV : sympoisum held April 13-17, 1998, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

524

Pub. Year:

1998

Page(from):

273

Pub. info.:

Warrendale, Penn.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994300 [1558994300]

Language:

English

Call no.:

M23500/524

Type:

Conference Proceedings

Details

TDL ID:	ZA00018918
Series ID:	PA00000011
Conf. info. (Name):	Symposium on applications of synchrotron radiation techniques to materials science
Conf. info. (Number):	4th
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1998.04.13-1998.04.17

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