X-ray Diffuse Scattering Investigation of Defects in Ion-Implanted and Annealed Silicon
- Author(s):
- Publication title:
- Applications of synchrotron radiation techniques to materials science IV : sympoisum held April 13-17, 1998, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 524
- Pub. Year:
- 1998
- Page(from):
- 95
- Pub. info.:
- Warrendale, Penn.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994300 [1558994300]
- Language:
- English
- Call no.:
- M23500/524
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Clusters And Planar Defects In Boron Implanted Silicon--- An X-Ray Diffuse Scattering Study
Materials Research Society |
North-Holland |
2
Conference Proceedings
Diffuse X-ray Scattering Study of Defects Created by keV Ion Implants in Si
MRS - Materials Research Society |
North Holland |
3
Conference Proceedings
Diffuse X-ray Scattering Study of Defects Created by keV Ion Implants in Si
MRS - Materials Research Society |
9
Conference Proceedings
NEAR SURFACE STRUCTURES OF ION IMPLANTED Si STUDIED BY GRAZING INCIDENCE X-RAY SCATTERING
Materials Research Society |
Materials Research Society |
Trans Tech Publications |
North Holland |
MRS - Materials Research Society |
North-Holland |
MRS - Materials Research Society |