Analysis of Copper and Low-K Dielectric Interconnect System for 0.18-ヲフm Technology
- Author(s):
Lin, X. W. Hui, K. Chanderhari, K. Bothra, S. Pramanik, D. Findley, P. - Publication title:
- Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 514
- Pub. Year:
- 1998
- Page(from):
- 399
- Pub. info.:
- Warrendale, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994201 [1558994203]
- Language:
- English
- Call no.:
- M23500/514
- Type:
- Conference Proceedings
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