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Reactive Ion Etching (RIE)-Induced p- to n-Type Conversion in Extrinsically-Doped p-Type HgCdTe

Author(s):
Musca, C. A.
Smith, E. P. G.
Siliquini, J. F.
Dell, J. M.
Antoszewski, J.
Piotrowski, J.
Faraone, L.
2 more
Publication title:
Infrared applications of semiconductors II : symposium held December 1-4, 1997, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
484
Pub. Year:
1998
Page(from):
353
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993891 [1558993894]
Language:
English
Call no.:
M23500/484
Type:
Conference Proceedings

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