Fabrication of fused silica phase masks by reactive ion etching

Fabrication of fused silica phase masks by reactive ion etching

Author(s):

Chen,G. ( Northern Jiaotong Univ. )

Publication title:

Holographic Optical Elements and Displays

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2885

Pub. Year:

1996

Page(from):

164

Page(to):

168

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422866 [081942286X]

Language:

English

Call no.:

P63600/2885

Type:

Conference Proceedings

Details

TDL ID:	ZA00018884
Series ID:	PA00000029
Conf. info. (Name):	Photonics China : Holographic Optical Elements and Displays
Conf. info. (Number):	1996
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	1996.11.04-1996.11.05

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