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Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores

Author(s):
Kulipanov,G.N. ( Budker Institute of Nuclear Physics )
Makarov,O.A.
Mezentseva,L.A.
Mishnev,S.I.
Nazmov,V.P.
Pindyurin,V.F.
Skrinsky,A.N.
Artamonova,L.D.
Cherkov,G.A.
Gashtold,V.N.
Prokopenko,V.S.
Chesnokov,V.V.
Reznikova,E.F.
8 more
Publication title:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2723
Pub. Year:
1996
Page(from):
268
Page(to):
275
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420992 [0819420999]
Language:
English
Call no.:
P63600/2723
Type:
Conference Proceedings

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