Simulation and modeling of electron-beam lithography for delineating 0.2-ｦﾌm line and space patterns

Simulation and modeling of electron-beam lithography for delineating 0.2-ｦﾌm line and space patterns

Author(s):

Ham,Y.-M. ( Seoul National Univ,and Hyundai Electronic Semiconductor Research and Development Lab. )
Lee,C.-B.
Suh,T.W.
Chun,K.
Lee,J.

Publication title:

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2723

Pub. Year:

1996

Page(from):

159

Page(to):

168

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420992 [0819420999]

Language:

English

Call no.:

P63600/2723

Type:

Conference Proceedings

Details

TDL ID:	ZA00018868
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing
Conf. info. (Number):	1996 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1996.03.11-1996.06.13

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