Mark topography for alignment and registration in projection electron lithography
- Author(s):
Farrow,R.C. ( AT&T Bell Labs. ) Mkrichyan,M.M. Bolen,K. Blakey,M. Biddick,C. Fetter,L.A. Huggins,H.A. Tarascon,R.G. Berger,S.D. - Publication title:
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2723
- Pub. Year:
- 1996
- Page(from):
- 143
- Page(to):
- 149
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420992 [0819420999]
- Language:
- English
- Call no.:
- P63600/2723
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Electron-beam and x-ray lithographic characteristics of the optical resist ARCH
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Characterization of the alignment system on a laboratory extreme ultraviolet lithography tool
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
Stochastic interactions in particle-projection systems: comparison of theory and Monte Carlo simulations
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |