New electron-beam mask-writing system for 0.25-ヲフm lithography
- Author(s):
Satoh,H. ( Hitachi Central Research Lab. ) Someda,Y. Saitou,N. Kawasaki,K. Itoh,H. Mizuno,K. - Publication title:
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2723
- Pub. Year:
- 1996
- Page(from):
- 102
- Page(to):
- 111
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420992 [0819420999]
- Language:
- English
- Call no.:
- P63600/2723
- Type:
- Conference Proceedings
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