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Novel GOI Failure Analysis Using SEM/MOS/EBIC with SubNano Ampere Current Breakdown

Author(s):
Publication title:
Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3322
Pub. Year:
1997
Page(from):
80
Page(to):
91
Pub. info.:
Pennington, NJ: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427656 [0819427659]
Language:
English
Call no.:
P63600/3322
Type:
Conference Proceedings

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