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Photoresist focus exposure matrix (FEM) measurements using critical-dimension atomic force microscopy (CD AFM)

Author(s):
Publication title:
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3332
Pub. Year:
1998
Page(from):
631
Page(to):
641
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427779 [0819427772]
Language:
English
Call no.:
P63600/3332
Type:
Conference Proceedings

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