Comparison of recent development models in optical lithography simulation
- Author(s):
- Arthur,G.G. ( Rutherford Appleton Lab. (UK) )
- Wallace,C. ( GEC Plessey Semiconductors Ltd. (UK) )
- Martin,B. ( GEC Plessey Semiconductors Ltd. (UK) )
- Publication title:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3332
- Pub. Year:
- 1998
- Page(from):
- 538
- Page(to):
- 549
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- Language:
- English
- Call no.:
- P63600/3332
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Metric for process optimization on substrates with transparent stacks in optical lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Assessment of resist-specific isofocal behavior in optical lithography at half-micron resolution
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Optimizaion of dielectric antireflective coatings on a transparent substrate in sub-half-micron CMOS technology
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Effect of reticle manufacturing quality on full chip optical proximity correction
SPIE - The International Society for Optical Engineering |