Manufacturability of subwavelength features using reticle and substrate enhancements

Manufacturability of subwavelength features using reticle and substrate enhancements

Author(s):

McCallum,M. ( Motorola (UK) and SEMATECH )
Lucas,K.D ( Motorola )
Maltabes,J.G. ( Motorola )
Kling,M.E. ( Motorola )

Publication title:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3332

Pub. Year:

1998

Page(from):

391

Page(to):

402

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

Language:

English

Call no.:

P63600/3332

Type:

Conference Proceedings

Details

TDL ID:	ZA00018777
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithograph
Conf. info. (Number):	1998 : 12th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings Design,reticle,and wafer OPC manufacturability for the 0.18-ｦﾌm lithography generation Lucas,K.D., McCallum,M., Falch,B.J., Wood,J.L., Kalk,F.D., Henderson,R.K., Russell,D.R. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Litho clusters with integrated metrology:the next step in continuous flow manufacturing Stanley,T., Maltabes,J.G., Mautz,K.E., Dougan,J., Charles,A.B., Garbayo,J. SPIE - The International Society for Optical Engineering
2 Conference Proceedings 0.25-ｦﾌm logic manufacturability using practical 2D optical proximity correction Kling,M.E., Lucas,K.D., Reich,A., Roman,B.J., Chuang,H., Gilbert,P.V., Grobman,W.D., Travis,E.O., Tsui,P., Vuong,T., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Progress on 300-mm wafer lithography equipment and processes Mautz,K.E., Maltabes,J.G. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning Sturtevant,J.L., Allgair,J., Fu,C.-C., Green,K.G., Hershey,R.R., Kling,M.E., Litt,L.C., Lucas,K.D., Roman,B.J., … SPIE - The International Society for Optical Engineering	9 Conference Proceedings Multiresolution approach to object classification using kinematic features Chen,H.-W., Schmitt,H.A., Riddle,J.G., Mashima,S.K., Healy,D.M. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Practicing extension of 248-nm DUV optical lithography using trim-mask PSM Kling,M.E., Cave,N., Falch,B.J., Fu,C.-C., Green,K.G., Lucas,K.D., Roman,B.J., Reich,A.J., Sturtevant,J.L., Tian,R., … SPIE - The International Society for Optical Engineering	10 Conference Proceedings Plasma antireflective coating optimization using enhanced reflectivity modeling Lucas,K.D., Vasquez,J.A., Jain,A., Filipiak,S.M., Vuong,T., King,C.F., Roman,B.J. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Reticle cleanliness and handling issues in submicron wafer fabrication Kling,M.E. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Appication of an Electrochemical Copper Metallization-Planarization Process to sub-0.25 um Features Sun, J.J., Taylor, E.J., Inman, M.E., Leady, K.D., Cortez, R. Electrochemical Society
6 Conference Proceedings CPL reticle technology for advanced device applications Conley, W.E., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node Dieu, L., Fanucchi, E.L., Hughes, G.P., Maltabes, J.G., Mellenthin, D.L., Conley, W., Litt, L.C., Lucas, K., Socha, … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12