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CMOS compatibiltity of high-aspect-ratio micromachining (HARM) in bonded silicon-on-insulator (BSOI)

Author(s):
  • McNie,M.E. ( Defence Evaluation and Research Agency Malvern (UK) )
  • King,D.O. ( Defence Evaluation and Research Agency Malvern (UK) )
Publication title:
Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3511
Pub. Year:
1998
Page(from):
277
Page(to):
285
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429704 [0819429708]
Language:
English
Call no.:
P63600/3511
Type:
Conference Proceedings

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