Resistance of dichromated gelatin as photoresist

Resistance of dichromated gelatin as photoresist

Author(s):

Lin,P. ( Tsinghua Univ. )
Yan,Y.
Jin,G.
Wu,M.

Publication title:

Materials and Device Characterization in Micromachining II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3875

Pub. Year:

1999

Page(from):

230

Page(to):

238

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434722 [0819434728]

Language:

English

Call no.:

P63600/3875

Type:

Conference Proceedings

Details

TDL ID:	ZA00018559
Series ID:	PA00000029
Conf. info. (Name):	Micromachining and Microfabrication : Marterials and Deveice Characterization in Micromachinig
Conf. info. (Number):	1999 : 2nd
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.09.20-1999.09.21

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