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Critical dimension and oxide damage control during poly/polycide etching on a TCP9400SE using the SEERS plasma diagnostic system

Author(s):
Derie,M. ( ST Microelectronics )  
Publication title:
Process and equipment control in microelectronic manufacturing : 19-20 May 1999, Edinburgh, Scotland
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3742
Pub. Year:
1999
Page(from):
144
Page(to):
153
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432223 [0819432229]
Language:
English
Call no.:
P63600/3742
Type:
Conference Proceedings

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