Ultrathin photoresists for EUV lithography
- Author(s):
Rao,V. ( Intel Corp. ) Cobb,J.L. Henderson,C.C. Okoroanyanwu,U. Bozman,D.R. Mangat,P.J. Brainard,R.L. Mackevich,J. - Publication title:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3676
- Pub. Year:
- 1999
- Vol.:
- Part2
- Page(from):
- 615
- Page(to):
- 626
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- Language:
- English
- Call no.:
- P63600/3676
- Type:
- Conference Proceedings
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