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Step and flash imprint lithography:a new approach to high-resolution patterning

Author(s):
Colburn,M. ( Univ.of Texas/Austin )
Johnson,S.
Stewart,M.
Damle,S.
Bailey,T.C.
Choi,B.
Wedlake,M.
Michaelson,T.
Sreenivasan,S.V.
Ekerdt,J.G.
Willson,C.G.
6 more
Publication title:
Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3676
Pub. Year:
1999
Vol.:
Part1
Page(from):
379
Page(to):
389
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431509 [0819431508]
Language:
English
Call no.:
P63600/3676
Type:
Conference Proceedings

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